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                    Hello, welcome to Rankuum Machinery Ltd English / Chinese
                    Product display
                    Series JC Magnetron Sputtering Coater
                    • Uses and features
                    • Specification parameter
                      Use and Features
                       
                      ●Magnetron sputtering coater is mainly used in substrate-based coating of metal, semiconductor, dielectric, multi-element compound or mixture. Sputtering is an applicable method for preparation of metal film, semi-conductor film, insulating film, hard film, heat-resisting film, corrosion-resistant film, super-conduct film, magnetic film, optical film and other films with special performance.
                      ●Magnetron sputtering coating is popularly used for its wide range of coating, good controllability, high repeatability and filming density, strong adhesion and low temperature rise in the substrate as well as other features.
                      JC系列磁控濺射鍍膜機
                      Series JC Magnetron Sputtering Coater
                       
                      主要機型及參數
                      Main models and parameters
                      型號
                      Model
                      應用特點
                      Application field
                      裝片工作臺特點
                      Features of film loading bench
                      基片尺寸
                      Size of substrate
                      產量/每小時
                      1μ鋁層厚度
                      Output per hour 1μm aluminum coating thickness
                      厚度
                      均勻性
                      thickness homogeneity
                      真空系統
                      Vacuum system
                      JC400-1/D 適合科研、生產硅片及砷化鎵片
                      Scientific research,production of silicon film and gallium arsenide film
                      全自動盒對盒送片,濺射源數量可按工藝調整,低塵粒
                      Full automatic box-to-box film advance;quantity of sputtering source to be adiusted as per the process;low in density of dust particles
                      4~6″ 40 ±5% 低溫泵加
                      分子泵系統
                      Cryogenic pump system added with molecular pump
                      JC500-1/D 適用于圓形片狀工件
                      Circular sheet work-piece
                      工件可進行公轉,水平裝片
                      Revolution of work-piece available;horizontal film loading
                      4″ 16 ±8% 分子泵系統
                      Turbomolecular pump system
                      JC500-5/D 適用于矩形片狀工件
                      Rectangular sheet work-piecevv
                      工件可進行公轉,垂直裝片
                      Revolution of work-piece available;vertical film loading
                      150x150mm 10 ±8% 分子泵系統
                      Turbomolecular pump system
                      JC600-1/D 適用于矩形片狀工件
                      Rectangular sheet work-piecevv
                      工件架為十邊拄形,垂直裝片
                      work-piece holder in decagonal column shape;vertical film loading
                      280x100mm 20 ±8% 擴散泵系統
                      Diffusion pump system
                      JC600-2/D 適合科研、生產砷化鎵基片線寬亞微米級
                      Scientific research,production of gallium arsenide film with line width at submicron level
                      工件可進行自傳、公轉
                      水平裝片
                      Rotation and revolution of work-piece available;horizontal film loading
                      3″ 24 ±5% 低溫泵系統
                      Cryogenic pump system
                      JC650-1/D 適用于矩形或圓形片狀工件
                      Rectangular or circular sheet work-piece
                      工件可進行公轉,水平裝片
                      revolution of work-piece available;horizontal film loading
                      Φ100mm 10 ±5% 分子泵系統
                      Turbomolecular pump system
                       

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