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                    產品展示
                    ?JC系列磁控濺射鍍膜機
                    • 用途及特點
                    • 規格參數
                      JC系列用途及特點
                      Use and Features
                       
                      ●磁控濺射鍍膜設備主要用于在基片上鍍制金屬、半導體、電介質、多元素化合物或混和物。利用濺射法可制備金屬膜、半導體膜、絕緣膜、硬質膜、耐熱膜、耐腐蝕膜、超導膜、磁性膜、光學膜等各種特殊性能的薄膜。
                      ●基片尺寸適應范圍廣,可鍍制多種材料,工藝可控性好、靈活性強、重復性高、基片溫升小、膜層附著力強,計算機全自動控制,******性高。且安裝維護方便,占地位置小。
                      JC系列磁控濺射鍍膜機
                      Series JC Magnetron Sputtering Coater
                       
                      主要機型及參數
                      Main models and parameters
                      型號
                      Model
                      應用特點
                      Application field
                      裝片工作臺特點
                      Features of film loading bench
                      基片尺寸
                      Size of substrate
                      產量/每小時
                      1μ鋁層厚度
                      Output per hour 1μm aluminum coating thickness
                      厚度
                      均勻性
                      thickness homogeneity
                      真空系統
                      Vacuum system
                      JC400-1/D 適合科研、生產硅片及砷化鎵片
                      Scientific research,production of silicon film and gallium arsenide film
                      全自動盒對盒送片,濺射源數量可按工藝調整,低塵粒
                      Full automatic box-to-box film advance;quantity of sputtering source to be adiusted as per the process;low in density of dust particles
                      4~6″ 40 ±5% 低溫泵加
                      分子泵系統
                      Cryogenic pump system added with molecular pump
                      JC500-1/D 適用于圓形片狀工件
                      Circular sheet work-piece
                      工件可進行公轉,水平裝片
                      Revolution of work-piece available;horizontal film loading
                      4″ 16 ±8% 分子泵系統
                      Turbomolecular pump system
                      JC500-5/D 適用于矩形片狀工件
                      Rectangular sheet work-piecevv
                      工件可進行公轉,垂直裝片
                      Revolution of work-piece available;vertical film loading
                      150x150mm 10 ±8% 分子泵系統
                      Turbomolecular pump system
                      JC600-1/D 適用于矩形片狀工件
                      Rectangular sheet work-piecevv
                      工件架為十邊拄形,垂直裝片
                      work-piece holder in decagonal column shape;vertical film loading
                      280x100mm 20 ±8% 擴散泵系統
                      Diffusion pump system
                      JC600-2/D 適合科研、生產砷化鎵基片線寬亞微米級
                      Scientific research,production of gallium arsenide film with line width at submicron level
                      工件可進行自傳、公轉
                      水平裝片
                      Rotation and revolution of work-piece available;horizontal film loading
                      3″ 24 ±5% 低溫泵系統
                      Cryogenic pump system
                      JC650-1/D 適用于矩形或圓形片狀工件
                      Rectangular or circular sheet work-piece
                      工件可進行公轉,水平裝片
                      revolution of work-piece available;horizontal film loading
                      Φ100mm 10 ±5% 分子泵系統
                      Turbomolecular pump system
                       

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